Used DNS / DAINIPPON SK-2000 #9277248 for sale
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ID: 9277248
Wafer Size: 8"
(4) Coater / (4) Developer systems, 8"
Resist temperature system
Resist Pump
Wafer shape: SNNF
Wafer cassette: 8" PP MIRAIAL
(2) Process blocks
(2) Coater heads
(2) Barc coater heads
(4) Develop heads
(2) Adhesion chambers
(10) Cooling plates
(12) Rapid hot plates
(3) Hot plates
(1) EEW
(1) EEFT
(1) IFB
(1) Source bottle cabinet
(1) Chemical box (HMDS/Solvent/NMDW)
(1) Controller cabinet
(1) Power box
(1) Handling unit controller
(1) Carrier station
(6) Nozzle
Cup:
Top cup material: PP
Middle cup material: PP
Bottom cup material: PPS
Spin chuck:
Material: Peek
Back rinse flow meter with flow sensor
Mist nozzle flow meter with flow sensor
Edge cleaner flow meter with sensor
With VPS+ option
Solvent solution supply
Drain central
Barc
Nozzle slit scan nozzle
Develop solution supply Central supply
Developer Cup PVC
Spin chuck PEEK
Develop nozzle flow meter with sensor
Develop nozzle wash meter with sensor
Rinse nozzle flow meter with sensor
Back rinse flow meter with sensor
Develop temperature System
Control for 1 line x 2
Drain central
Adhesion
Method vapor prime by N2 bubbling
Hot plate 60-150 deg by 0.1 deg pitch
HMDS solution supply central supply
Hot plate
Method proximity bake with ceramic ball
Hot plate 50-180 deg by 0.1 deg pitch
Cooling plate
Rapid hot plate.
DNS / DAINIPPON SK-2000 is a digital photoresist equipment that uses lasers and a novel optical system to enhance the accuracy of exposure patterns and helps to ensure that features can be accurately reproduced accurately on substrates with feature sizes as small as a few hundred nanometers. DNS SK2000 utilizes a pulsed laser beam that is focused to a spot size of 5 um on the substrate and is mounted on a x-y galvanometer scanner. The pulse width is programmable from 2 to 12ns and the energy is programmable from 50mJ to 1J. The laser is mounted on a vertical scanner that is connected to a precision x-y galvanometer scanner. The laser and scanner are synchronized to create accurate exposure patterns on the substrate. The exposure pattern is then defined by the user interface, which allows for the drawing of exposure patterns on the substrate. DAINIPPON SK 2000 also utilizes a proprietary optical unit that combines the exposure pattern with the film thickness of the substrate. This allows for accurate exposure patterns on substrates with feature sizes as small as a few hundred nanometers. Additionally, the exposure patterns can be optimized for a specific substrate, allowing for greater accuracy and precision. In addition to its laser and optical systems, DNS / DAINIPPON SK 2000 is equipped with a temperature control unit which allows temperature-sensitive substrates to be used in the exposure process. This allows for a higher resistivity and heat tolerance of the exposed material. In addition to its precision and accuracy, DNS SK-2000 offers a broad range of exposure patterns that can be used. It is designed to be used in a variety of processes including photolithography, deposition techniques such as chemical vapor deposition, and dry etching. Its wide range of exposure patterns allow for improved throughput and shorter process times. DNS SK 2000 is an advanced photoresist machine. It utilizes several unique features including a pulsed laser, an advanced optical tool, a precision scanner, and a temperature control unit. These features enable the accurate and precise reproduction of exposure patterns on substrates with feature sizes as small as a few hundred nanometers. Additionally, the wide range of exposure patterns it offers enable faster throughput and shorter processing times. This makes DNS / DAINIPPON SK2000 an ideal choice for a wide range of applications in photolithography, deposition techniques, and dry etching.
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