Used DNS / DAINIPPON SK-2000 #9384471 for sale
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ID: 9384471
Wafer Size: 8"
Vintage: 2000
(4) Coater / (4) Developer systems, 8"
2000 vintage.
DNS / DAINIPPON SK-2000 is a photoresist equipment, specialized for advanced and ultrafine structuring applications. It is designed to fulfill the needs of microelectronics such as SEMICON, MEMS and packaging, as well as automotive and LED suppliers. This system leverages a sophisticated optical filtering method to overcome limitations of traditional photoresist systems. It utilizes a quartz lamp with adjustable current and temperature, a three-dimensional scanning unit to move the necessary parts of the exposure tool including the focusing lens and angles of scan pattern and a programmable digital controller for accurate control of these functions. DNS SK2000 also expands on the traditional photoresist machine with the additonal AI-POV (Artificial Intelligence Programmable Optical Visibility) feature. This feature assists in achieving higher quality and repeatable results. AI-POV is a configuration of electronic functions that improves resolution capabilities and allows for automated functions to control the printing process more accurately. DAINIPPON SK 2000 also offers improved handling of high engine speed with a vibration reduction tool and a full-showing imaging processing asset. This feature optimizes the resolution and reduces laser beam deterioration caused by vibration. Furthermore, the powdering factor of the lens is improved with the OS-auto-rotary feature, leading to reduced costs and improved user efficiency. DNS SK 2000 also boasts a high resolution, high accuracy, low contamination and improved production speed compared to previous models. Additionally, it is equipped with a comprehensive safety model and a universal operation equipment for user-friendly control. This system also incorporates error correction features which are able to detect and compensate for any errors in the unit. Overall, DNS SK-2000 is a highly advanced and efficient photoresist machine with a host of new features that make it an indispensable tool for microelectronics, MEMs and other advanced applications. Its high resolution, low contamination, and comprehensive safety features make it an ideal choice for its target processes.
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