Used DNS / DAINIPPON SK-200W-BVPE #9165403 for sale

DNS / DAINIPPON SK-200W-BVPE photoresist equipment is a high-performance, high-precision lithography and etching tool for microfabrication. It is specifically designed for use in the manufacture of integrated circuits (ICs) and other devices on extremely small scales. The system features a wide variety of features which make it an attractive choice for the manufacture of modern ICs. DNS SK-200W-BVPE unit consists of a high-intensity UV light projection machine, an automated spray module, an automatic wet-table spray unit, and a microcontroller-based control panel. The projection tool projects a UV pattern generated by a computer onto a substrate, allowing precise device patterning with industry standard feature sizes. The spray module is computer-controlled and offers a selection of nozzle sizes and spray pressures, giving the flexibility to create different exposed layer thicknesses. The wet-table spray unit allows for the precisely controlled application of monomers and other chemicals to create different photoresist layers. DAINIPPON SK-200W-BVPE also features a state-of-the-art microcontroller asset, which provides UV exposure times, pressure levels, spray rates, and exposure area sizes that are predetermined by the user. This allows for precise patterning of devices, leading to shorter lead times and higher yields. The model also offers adjustable focus settings for different layers and features an advanced anti-aliasing algorithm to ensure smooth edges. SK-200W-BVPE is capable of operating in any temperature range and humidity level, making it suitable for a variety of manufacturing environments. Additionally, it features an advanced temperature control equipment which allows for better sublimation rates, improved yields, and increased throughput. Additionally, the system offers a rapid response time, allowing for faster cycles and lower setup times. Overall, DNS / DAINIPPON SK-200W-BVPE unit is an incredibly powerful photoresist machine which offers high-precision lithography and etching capabilities for use in the manufacture of modern ICs and other devices on extremely small scales. It offers a variety of features to meet the needs of any IC manufacturer, from user-defined UV exposure times to adjustable focus levels and advanced anti-aliasing algorithms. This makes it an attractive choice for modern IC fabrication processes.