Used DNS / DAINIPPON SK-60B #293606032 for sale

DNS Screen DNS / DAINIPPON SK-60B is a photoresist processing equipment that offers optimum performance for etching, coating, and developing of substrates for the graphic arts, electronics, and semiconductors industries. This system is ideal for applications such as photo-etching, printed circuit board fabrication, semiconductor fabrication, and other processes requiring precise exposure and development of photoresists. The unit utilizes a combination of laser and optical systems with an integrated rotary camera, to achieve high-accuracy exposure and development of photoresists. The photoresist is applied to the substrate, then exposed to an array of laser beams, and finally processed through the camera. The laser beams are used to generate an etched pattern on the substrate. The pattern is then developed with a developer solution, which is injected into the camera in small amounts. The machine is controlled by a computer and includes a range of accessories such as software, a control panel, a developer supply unit, an exposure unit, an inline powder device, and a development chamber. The software is designed to manage the processing settings, and the control panel is equipped with various monitoring functions including exposure and process length. The developer supply unit manages the developer solution and allows for precise amounts to be injected into the camera for development. The exposure unit, equipped with a variety of lenses, is used to project the laser pattern onto the substrate. The inline powder device allows for the injection of a light powder into the camera chamber, which helps to prevent the buildup of photoresist residue. Lastly, the development chamber is equipped with a special optical filter that helps to release any remaining photoresist residue from the substrate. Overall, DAINIPPON Screen DNS SK-60B provides users with an advanced and highly accurate photoresist processing tool that is ideal for numerous industries. By combining laser technology and proprietary software, this asset allows for precise exposure and development of substrates with minimal photoresist residue.