Used DNS / DAINIPPON SK-80BW-AVPE #9298989 for sale

DNS / DAINIPPON SK-80BW-AVPE
ID: 9298989
Wafer Size: 6"
Coater / Developer system, 6".
DNS / DAINIPPON SK-80BW-AVPE is a state-of-the-art photoresist equipment that provides a very high degree of accuracy and reliability. This machine is ideal for producing complex intricacies in semi-conductors and thin-film circuits. DNS SK-80BW-AVPE is designed with the capacity to handle a wide variety of resist materials from aqueous bases to organic solvents to total developer, as well as to create features such as line width down to 200nm and aspect ratio above 10:1. The system offers a high degree of accuracy, with a resolution of around one micron, and automatic refresh functions that enable the unit to minimize line-edge roughness. The machine also uses proprietary algorithms to measure and maintain the highest levels of quality. The machine also features self-curing capability, enabling researchers and engineers to perform experiments on materials and chips without the need for additional baking steps. This speeds up the process of fabrication and testing. DAINIPPON SK 80BW AVPE also features an integrated vision tool that allows precise alignment and accurate features placement down to 5 microns. DAINIPPON SK-80BW-AVPE is designed to provide maximum productivity, with an automated asset and built-in computer-controlled diagnostics that help to minimize downtime and optimize yield. It also has the capacity to run multiple shifts, with an automated recipe model that simplifies switching between different equipment operating parameters. The system is flexible and can be easily adapted to different photoresist materials, providing a long life span. In conclusion, DNS SK 80BW AVPE is an innovative photoresist unit that offers advanced features for fabricating and testing semi-conductors and thin-film circuits. The machine is equipped with an integrated vision machine, automated recipe tool, self-curing capability, and it is designed with a capacity to handle a wide variety of resist materials. All these features combined provide researchers and engineers with an accurate and reliable tool for producing complex intricacies quickly and easily.
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