Used DNS / DAINIPPON SK-80BW-AVPE #9298990 for sale

DNS / DAINIPPON SK-80BW-AVPE
ID: 9298990
Wafer Size: 6"
Coater / Developer system, 6".
DNS / DAINIPPON SK-80BW-AVPE is a wet processing photoresist equipment used for advanced semiconductor manufacturing, designed to provide the highest speed, precision, and accuracy in applications such as wafer photolithography. The system consists of three main components: the main unit (including the exposure head), the control cabinet, and the power distribution and control box. The main unit helps to accurately and precisely control the exposure process, while the control cabinet and power distribution and control box help to protect the unit from power disturbances. The exposure head is a combined light source and slit mask assembly, consisting of an internal lamp housing, slit masks, on-board slit alignment and registration mechanisms, and a power supply and lamp control machine. The tool also includes a cooling asset to prevent any thermal gradients that could affect the exposure process. The slit masks are designed to be easily replaceable, allowing for different light patterns to be used for different applications. An external computer connectivity is also available and enables the user to program the model for different wafer sizes and exposures. The software used to control the equipment allows for precise control of the exposure parameters such as the exposure time and energy levels. DNS SK-80BW-AVPE photoresist system is built to have high-precision accuracy, and its proprietary slit mask design provides a high-resolution image providing increased capacity in optical clarity. The unit is also designed for data analysis, with up to 64 data points obtainable from a single photoresist application. The machine is both robust and reliable, and is capable of providing precise and repeatable results. Additionally, the tool is fully configurable and offers the ability to vary the exposure settings to accommodate different wafer sizes and thicknesses. This makes it well suited for a wide variety of photoresist processes, especially for those needing extreme accuracy and precision.
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