Used DNS / DAINIPPON SK-80BW-AVPE #9298993 for sale

DNS / DAINIPPON SK-80BW-AVPE is a deep-ultraviolet (DUV) photoresist equipment developed by DNS Screen. This system maintains a high level of performance with its integrated productivity, reliability, and accuracy that is necessary for technology-driven applications in the semiconductor industry. DNS SK-80BW-AVPE utilizes an automated vision-based pre-exposure (AVPE) inspection unit to ensure accurate wafer alignment prior to the lithography process. This machine utilizes a TTL laser diode technology to detect edge and center alignment, as well as steel mesh defect inspections. Additionally, its motorized optical zoom gives it the ability to accurately adjust the wafer size and center alignment at the same time. The inspections are performed with a pixel rate of 500/sec, which gives it the ability to detect the smallest microstructures to the coverage range of 75mm x 75mm. DAINIPPON SK 80BW AVPE features an on-board DUV illuminator that delivers the optimal dose of DUV light, with a maximum dose of 4 mJ/cm2, at a wavelength range of 300-340 nm. This tool also features a photochemical automation asset (PAS) which allows users to easily configure photoresist recipes and exposure parameters. The PAS also has the capability to store up to 99 recipes, which gives users the flexibility to switch between different recipes in a single process. SK-80BW-AVPE's innovative design also includes an internal temperature control model that eliminates the need for external chillers and provides reliable, repeatable photoresist performance. The chlorine dioxide loop flow equipment provides improved safety measures and a cost-effective solution. In addition, the system comes with a number of additional features that improve accuracy and productivity. These include an automatic doser, programmable exposure, two-stage automatic mixed etching and a multi-stable liquid-cooled illuminator. Overall, DNS / DAINIPPON SK 80BW AVPE unit offers a reliable and cost-effective photoresist solution for applications requiring high levels of precision and accuracy. Its high-performance feature set and comprehensive safety measures make it an ideal choice for modern microfabrication processes.