Used DNS / DAINIPPON SK-80BW-AVPF #9354132 for sale
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ID: 9354132
Wafer Size: 6"-8"
Vintage: 1997
(2) Coater / (2) Developer system, 6"-8"
Hot / Chill plates (7-25)
In-line
MICROBAR TrackMate chemical cabinet
Control rack
Interface
1997 vintage.
DNS / DAINIPPON SK-80BW-AVPF is a high-performance photoresist equipment specifically designed for advanced, next-generation lithography processes. It is designed to provide excellent process control, small feature resolution, and a high degree of performance. DNS SK-80BW-AVPF photoresist system consists of several components. Firstly, it contains a powerfully-accurate spin coater, which is capable of achieving a uniform coating of photoresist over a wide range of substrates and wafer sizes. The spin coater is constructed with an optimized design to effectively support a wide range of wafer sizes and coating parameters. This ensures that the photoresist is applied evenly across the entire substrate. DAINIPPON SK 80BW-AVPF also includes a highly accurate and finely-tuned bake station, which ensures that the photoresist is baked evenly and properly. Additionally, the bake station is usually configured with a multi-layer PEB (post-exposure bake) which prevents any non-uniformity in the resist coat, and reduces the risk of coating defects and particles. In addition, SK 80BW-AVPF unit includes a highly-accurate lithography exposure stage, designed to accurately align substrates and provide the most accurate and precise exposure time and intensity. This exposure stage maximizes the resolution of small features in the photoresist layer. Finally, DNS / DAINIPPON SK 80BW-AVPF includes a special post-develop chemical process station. This ensures that the photoresist is properly developed and properly removed from the substrate, resulting in a uniform, defect-free layer. Additionally, the post-develop process eliminates unwanted residues that can cause contamination and outgassing. Overall, DAINIPPON SK-80BW-AVPF is an advanced photoresist machine designed to provide excellent process control, small feature resolution, and a high degree of performance. It is an ideal tool for use in advanced, next-generation lithography processes, and can help ensure that the highest quality photoresist layer is obtained.
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