Used DNS / DAINIPPON SK-80BW-BVPE #9316585 for sale

DNS / DAINIPPON SK-80BW-BVPE is a high performance photoresist equipment designed primarily for use in integrated circuit fabrication. The system is equipped with a patented dual jet process for processing both positive and negative-tone photoresists, allowing for superior aspect ratio control and surface accuracy. The state-of-the-art design of the unit also includes vacuum-assisted etching and chamber control, which facilitates fast and accurate application of photoresists. DNS SK-80BW-BVPE machine is comprised of a wet cleaning station and a photoresist coating tool, both of which are incorporated into a single, compact device. The wet cleaning station uses advanced robotic liquid delivery technology to simultaneously remove organic and inorganic contaminants, chemically and/or ultrasonically, and dried to a uniform and consistent surface free of particulate contamination. The photoresist coating asset uses a patented dual-jet process in which photoresist chemicals are delivered via two distinct jets: one each for positive (PMMA) and negative (SU-8) photoresist. The two different chemical formulations are precisely metered and introduced into a chamber equipped with an integrated atmospheric plasma generator to ensure uniform pattering of the chemical. The optimized flow of photoresist chemicals results in a consistently uniform layer of photoresist on the wafers, resulting in improved aspect ratio control and higher yields. The integrated etching chamber allows for precision etching of the photoresist without the need for additional processing steps. Vacuum-assisted etching of the resists is enabled, driving away volatile photoresist components to a separate chamber and increasing yield. Finally, DAINIPPON SK-80BW-BVPE model offers superior chamber stability and control, allowing for uniform, repeatable processing of the photoresists. In summary, SK-80BW-BVPE photoresist equipment is designed with state-of-the-art features specifically tailored to integrated circuit fabrication. The system's dual jet process and integrated etching chamber allow for superior aspect ratio control, higher yields, faster processing, and improved surface accuracy. The optimized flow of photoresists and integrated plasma generator provide consistent, uniform patterns with reduced waste. The overall result is a reliable, high-performance unit designed to produce photoresists to meet today's rigorous manufacturing requirements.