Used DNS / DAINIPPON SK-W80A #9144966 for sale

DNS / DAINIPPON SK-W80A is a photoresist equipment used to fabricate semiconductor wafers. The system uses a resist coating material, which is exposed to intense light to etch desired features into a wafer. This technology comes from an advanced photolithography process that involves ultraviolet light, exposing photosensitive materials (photoresists) to define circuit patterns on semiconductors. The process starts with a layer of photoresist, which is spin-coated onto a semiconductor wafer surface. Once spin-coated, DNS SK-W80A then exposes the photoresist with ultraviolet light from a projection stepper. During this process, the photoresist is patterned according to the desired circuit pattern. The areas exposed to the light become insoluble, while the non-exposed areas remain soluble. Next, the exposed photoresist is developed in a chemical developer. This developer removes the non-exposed photoresist while leaving the insoluble resist as a protective layer which covers the desired circuit patterns. Additional chemical processes such as etchants and metalization are used to complete the circuit pattern. Finally, the photoresist is removed to expose the newly created semiconductor pattern. DAINIPPON SKW-80A has a number of advanced features that make it suitable for fabricating wafers in the nanometer level. The unit offers a highly sensitive resist coating material, a high-precision exposure technique, and a mechanized dispense machine. This ensures precision accuracy when coating and exposing a semiconductor wafer. Additionally, its built-in aligner allows lower exposure exposure times of just 0.1 mJ/cm2, while delivering quality exposure patterns with high resolution and superb repeatability. This makes the tool intensively suited for the manufacturing of wafers with designing features at the nanometer level. The asset also has advanced temperature control, making it suitable for material such as low sensitivity Sn ions and 0.75 um diameter nano-wires. It has advanced process control features such as precision exposure techniques, and the model can be operated in a variety of environments, even under extreme temperatures. DNS / DAINIPPON SKW-80A also has a built-in process chamber for coating resist and is available with a range of additional accessories to facilitate a continuous production process. To sum up, DAINIPPON SK-W80A is a high-precision photoresist equipment that enables the fabrication of wafers with nanometer-level features. Its sensitive resist coating material and advanced process control features make it suitable for a variety of production processes, even under extreme temperatures. Its built-in aligner and dispense system ensure quality exposure patterns with very high resolution and repeatability.