Used DNS / DAINIPPON SK-W80B-AVPE #293746067 for sale

DNS / DAINIPPON SK-W80B-AVPE photoresist equipment is a high-precision, automated solution for producing and processing 3D patterns on a variety of substrates, including semiconductors, magnetic materials, and thin film transistor arrays. It is designed to produce thin lines and fine details with a maximum resolution of 0.6 microns. DNS SK-W80B-AVPE is an all-in-one automated photolithography system with process capability and a built-in software suite to conduct calibration, photomask inspection, exposure, and post-exposure inspection. The automatic vision unit takes and processes photos of the exposed patterns and can adjust exposure time, stepper driving speed, and pattern location depending on the result. The machine includes a spin coater for the application of photoresist, a vacuum spin cleaner for removal of residual photoresist, a UV exposure unit with a full-frame mask aligner, a heat resist oven for resist baking, and a wet etching station. DAINIPPON SKW-80B-AVPE is capable of applying photo resist and double-frequency exposure, enabling the creation of patterns with higher aspect ratios. The tool has a user-friendly interface that allows the operator to monitor each process step in real time. It also includes a unique feature that allows for data sharing between multiple systems. This allows for pattern transfer, improved productivity and decreased downtime in production. DNS SKW-80B-AVPE is compatible with a wide range of substrates, including silicon, sapphire, quartz, diamond, glass, plastics, ceramics, and others. It is designed to reliably and repeatably produce 3D patterns on both flat and curved substrates with a wide range of line widths, pitches, and depths to meet the needs of various applications. DNS / DAINIPPON SKW-80B-AVPE is highly reliable and low-maintenance, providing users with a cost-effective solution for their photolithography needs. Its versatility, combined with its high resolution capabilities, make it an ideal asset for producing small and intricate patterns required for the production of advanced electronics and semiconductor devices.