Used DNS / DAINIPPON SK-W80B-AVPE #9300359 for sale

DNS / DAINIPPON SK-W80B-AVPE is a step-and-repeat photolithography equipment that utilizes a high-precision advanced vacuum-press system (AVP). This unit can produce electronic parts, semiconductor circuit patterns, and optical components with accuracies of 10 and 20nm, enabling extremely precise patterning of high-resolution materials. The machine utilizes a high-precision, linear motor-driven 5-axis linear motion stage and X-Y-Z-θ-Φ mechanism to scan and align patterns, ensure more accurate exposure positioning and kinematics accuracy, and reliably reduce the risk of pattern distortion. The tool is equipped with a tabletop and a manual wafer transfer station, so the wafer can be accurately placed on the stage and moved to the exposure station. An automated alignment asset is also available, allowing for precise alignment and repeatable repeatability. The model is designed to provide stable and accurate exposure and consistent performance throughout the production process. It is equipped with a high-dynamic range, high-precision step-staged deformable mirror equipment to enable high resolution exposures over a wide range of geometric features, including small needle-like features, while also ensuring accurate placement accuracy and uniform exposures. Additionally, the system can support an air gap gap-filling technique that can increase the effective light exposure and improve optical isolations. The unit is a compact and high-performance photolithographic machine with many integrated features, including laser diode illuminator with an average broadband laser power of 1.2W, high-accuracy vacuum press, moving stage, XYZθΦ movement machine, X-Y optical encoders, and programmable exposure parameters. Additionally, an anti-vibration tool is built-in to ensure vibration-free operations, and a built-in dust- and dirt-sealing structure prevents ambient dust and particles from entering the asset. DNS SK-W80B-AVPE is a rugged and reliable photolithographic model designed for high-precision processing. The equipment features a user-friendly interface and easy-to-set parameters to simplify the photolithographic process. The system is also fully compliant with SEMI P-14 and P-19 standards, making it an excellent choice for complex, high-precision photolithography needs.