Used DNS / DAINIPPON SK-W80B-AVPE #9362771 for sale

ID: 9362771
Wafer Size: 8"
Vintage: 1996
Coater / (2) Developer system, 8" IFB Left to right Interface 1996 vintage.
DNS / DAINIPPON SK-W80B-AVPE photoresist equipment is a high-precision system for developing images in wafer, email and other forms. It provides advanced photoresist control functions for both subtractive and additive processes. This unit is suitable for a vast range of applications and can be used to create highly efficient, micro-electronic printed circuit patterns. DNS SK-W80B-AVPE uses a resin-enhanced photoresist material for imaging resolution and high-contrast. This type of machine utilizes automatic exposure control to ensure that the image is presented with the best possible clarity and resolution. The photoresist material is etched when the chemical process is completed. As a result, foreground images can be accurately developed, and background images can be simultaneously etched away. In addition, DAINIPPON SKW-80B-AVPE also provides the ability to create repeatable, reliable results. This is achieved by automatically controlling exposure levels and the mixing of chemicals to produce the correct chemical reaction. The tool is capable of controlling parameters such as: pulse duration, exposure repetition rate, exposure time, soak time, and image contrast. This ensures the highest level of accuracy when creating images. DNS / DAINIPPON SKW-80B-AVPE is designed to provide a high-level of productivity, simplicity and safety. It includes multiple process integration solutions such as: dry and wet process methods, multiple layers and integration into existing systems. Its modular cabinet design also facilitates easy accessibility for maintenance and supplies of materials. Overall DAINIPPON SK-W80B-AVPE photoresist asset provides an efficient, precise, and reliable method for creating intricate images in a range of applications. With its advanced functions and features, it offers an ideal solution for mixed-signal printed circuit boards, along with many other applications. This model allows for the most advanced photoresist control and delivers consistently superior results.
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