Used DNS / DAINIPPON SKW-629 #9181757 for sale

DNS / DAINIPPON SKW-629 is a negative-tone, positive-acting photoresist equipment designed for use in semiconductor processing. It is an advanced, chemically amplified photoresist that is compatible with a variety of optical exposure tools. DNS SKW-629 is designed to optimize yield and performance for process control requirements in advanced lithography. It offers superior resolution, outstanding edge dependency, and high contrast. The photoresist provides excellent resist performance over a wide range of exposure environments. Its low-dose sensitivity helps to reduce process time and simplify wafer patterning. DAINIPPON SKW-629 resists has a dry etch resistance superior to other arcylic resist systems, ensuring a strong uniform etching result in plasma etching applications. It also has a carbon isolation layer that improves etch rate precision and yields better uniformity. The system also features improved film stability after long exposure to multiple ultra-violet (UV) lamps. The unit is designed to have improved imaging characteristics and to provide an excellent photo-defectivity profile. It is capable of creating a wide array of features from sub-micron to single layer to an advanced-multilayer design. The resist also offers excellent profile control, allowing for the design of a more uniform feature, and fast exposure times to reduce process time. The machine is compatible with a wide variety of components, including SEMI Standard cleaning products, etchants, developers, and vapor-phase deposition materials. The resist is ideal for use in 3D structures, as it can be patterned with minimal standing water, making for an easy final product. Finally, SKW-629 resists can be used in most popular wet processing chemicals, ensuring compatibility and quality throughout the entire process. Overall, DNS / DAINIPPON SKW-629 photoresist tool is designed to provide high-quality, repeatable results in a wide range of semiconductor fabrication applications. It offers superior resolution, rapid exposure times, and improved etch resistance. The resist offers excellent profile control, allowing a wide array of features to be created for a more uniform final product. In addition, the asset is compatible with the majority of industry standard components and cleaning products. Its well-rounded set of features make it an ideal choice for advanced lithography in modern chip fabrication.