Used DNS / DAINIPPON SKW-80A-BVPE #9198611 for sale
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ID: 9198611
Wafer Size: 8"
Vintage: 1992
Coater / (2) Developer system, 8"
IFB
Right to left
SSW
1992 vintage.
DNS / DAINIPPON SKW-80A-BVPE is a photoresist equipment that offers a highly reliable and cost-efficient solution for photo-etching, photolithography and other precision production processes. It is a resistive film system that provides extremely precise control over the size, shape and placement of patterns on a substrate. DNS SKW-80A-BVPE unit is a two-component machine consisting of a base layer and a top layer. Its top layer is composed of a thermosetting polyvinylphenol compound and a proprietary polymer. The bottom layer is a specially formulated photoresist material. The two layers are applied and cured simultaneously. The polyvinylphenol compound in the top layer is highly resistant to solvents and is very stable at high temperatures. This makes it ideal for use in high-temperature processes that would otherwise degrade the properties of normal photoresist materials. It is also useful for bonding layers of different resist materials on the same substrate, making it suitable for use in masking and patterning. The proprietary polymer in the bottom layer provides superior optical and electrical properties that enable it to accurately reproduce etched and printed patterns at high resolution and repeatability. It is also highly resistant to the leaching of chemicals and other materials used in etching and printing processes. DAINIPPON SKW-80A-BVPE tool provides excellent adhesion, making it suitable for use as a permanent photoresist asset in production lines. It is also resistant to moisture and common chemicals, ensuring stability over large volume production batches. Additionally, the model is compatible with a range of solvents and developers, making it suitable for use in a variety of different processes. In conclusion, SKW-80A-BVPE photoresist equipment is a reliable and cost-efficient solution for precision production process. Its highly resistant top layer offers superior optical and electrical properties, making it suitable for permanent photoresist systems in production lines. Its bottom layer is similarly resistant to common chemicals used during etching and printing processes. All these features make this photoresist system a reliable and cost-effective solution for different production needs.
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