Used DNS / DAINIPPON SP-W813 #293643045 for sale

DNS / DAINIPPON SP-W813 is an advanced lithographic equipment specifically designed for the production of photomasks and wafers used in semiconductor production. This system utilizes photolithography technology, which is the basic process used to create integrated circuits and other devices on a silicon wafer. Photolithography involves using light and chemical processes to transfer patterns onto the silicon wafer. This unit consists of several components that work together to create the desired pattern on the wafers. DNS SP-W813 consists of a light source, a masker unit, a reticle stage, an objective lens, an LED patten generator, an LED alignment unit, and a photoresist coating machine. The light source powers the LED alignment unit, which positions LEDs accurately on the reticle stage. The reticle stage is then loaded with a binary-coded mask that has the desired patterned image. The mask is then illuminated with extreme ultraviolet (EUV) light, which is generated by the LED patten generator. The EUV light then passes through the mask onto the wafer coated with photoresist. During this process the light transfers the desired pattern onto the wafer. Lastly, the photoresist is then developed to turn the specified area of the wafer to a cured and hardened material. DAINIPPON SPW-813's photoresist development systems allows for the precise control of developing time through its computer-controlled Ultra violet exposure processing. The photoresist tool is exposed to EUV light from the LED pattern generator, which activates the photoresist's photoacid generators, which dissolve the photoresist away from the specified area. SPW-813 features numerous features for creating high precision and high-quality wafers. After the photoresist is developed, DNS SPW-813 incorporates a high-resolution imaging asset that allows for clear images to be captured and analyzed with minimal image distortion and graininess. This model also offers easy to set up parameters that allow for the precise control of EUV emissions and a recessed optical design that minimizes heat generating components. Lastly, DAINIPPON SP-W813 has a minimally automated production equipment that helps reduce handling time and increase throughput. Overall, SP-W813 photolithography system is equipped with a variety of features and components to provide precise control of photoresist development, precise control of EUV emissions and precise imaging technology that enable users to create the highest quality images on the wafer. With these useful features and its computer-controlled process, DNS / DAINIPPON SPW-813 is one of the most advanced systems available for creating precise photomasks and wafers used in semiconductor production.