Used DNS / DAINIPPON SS-W60A-AV #9314198 for sale

DNS / DAINIPPON SS-W60A-AV is a photoresist equipment used for photolithography to produce accurate and reliable circuit patterns on semiconductor wafers. It provides a range of features to ensure optimal imaging performance, including a Mid-UV (248nm) Laser Source to provide high resolution images and high throughput. Additionally, it is equipped with a high-accuracy HeNe laser exposure system for aligning the exposure field with wafer positions during exposure. DNS SS-W60A-AV uses a variety of optics and photomasks to create highly accurate resist material patterns. It utilizes an image array scanner to synchronize the laser exposure machanism and ensure precise pattern presentation. The scanner is equipped with a high-power lens with a NA=0.5 to provide an overlapping pattern layout. This ensures that the patterns can be accurately overlapped in order to create more intricate patterns. DAINIPPON SS-W60A-AV also utilizes a variety of imaging technologies, including RIE, PRT, SLIT, and flatbed imaging. RIE is a reactive ion etch process that is used to etch layers from a substrate to create metal circuit patterns. PRT is a photoresist process used to accurately control the resist material by finely imaging the surface of the wafer at different angular orientations. SLIT is a lithography technique used to reduce particle sizes to create smaller features, and flatbed imaging is a more conventional imaging technique for simple patterns. The unit also includes a high accuracy stage and a wide range of other features to assist in precision alignment and imaging. These features include a 50nm accuracy stage movement, tilt compensation, anti-crawling systems, and an auto shutter operation machine. These features ensure that the images are accurately overlapped, resist material accurately controlled, and that alignment of the exposure field with the wafer is precise. In summary, SS-W60A-AV is a highly advanced Photoresist tool used in photolithography to create highly accurate and reliable patterns on semiconductor wafers. It utilizes a variety of imaging technologies, including RIE, PRT, SLIT, and flatbed imaging, as well as a host of other features to ensure the highest imaging performance and accuracy.