Used DNS / DAINIPPON SS-W629-BV #9282070 for sale
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DNS / DAINIPPON SS-W629-BV is a high-precision, multi-functional photoresist equipment with automated functionality. It is built around chemical-outside photomask technology, providing full precision for even the most sensitive devices. The system has five chambers that allow the operator to introduce and treat photolithographic films, as well as transferring and curing the films. The unit uses a two-step process to etch and form photoresist patterns. First, a thin film of transparent resist is applied to the surface of a photomask. Then a beam of ultra-violet (UV) light is passed through the pattern in the photomask onto the photoresist. This causes selective exposure and altering of the chemical bonds of the resist material, causing the material to change which areas cure and which remain soluble and removable. By varying exposure times, different parts of the desired pattern can be etched or exposed. DNS SS-W629-BV machine utilizes an extremely sensitive photo imaging tool, which ensures accurate pattern formation with much higher precision than more traditional resist systems. This is achieved by measuring the partial exposure on each layer of the photoresist film and adjusting exposure parameters accordingly. Additionally, an advanced interlayer transfer asset is used to accurately place the patterns on the photoresist film. DAINIPPON SS-W629-BV is compatible with a variety of development processes, ranging from dry methods, wet processes and spin-coating. It is also able to integrate into existing fabrication systems for a high-precision end result. Its automated functionality also provides greater accuracy, speed and reliability compared to manual operations. With its advanced technologies and automated capabilities, SS-W629-BV model is the perfect choice for anyone in need of high-precision photoresist systems. Its advanced imaging, transfer, and resist patterning functions make it ideal for the most sensitive of devices, providing maximum accuracy for a variety of processes. With its use of ultra-violet light and advanced interlayer transfer technologies, it is able to produce complex patterns with the highest precision possible.
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