Used DNS / DAINIPPON XS4-I #9179455 for sale

DNS / DAINIPPON XS4-I is a complex photoresist equipment that is suitable for a variety of photolithography processes such as hard and soft masking, component packaging, and flexible circuits. It is designed to meet the demands of high-grade photolithography processes with its wide exposure latitude and high resolution. Capable of achieving maximum clarity and reproducibility with tremendous precision, DNS XS4-I is a reliable solution for harsh process conditions. DAINIPPON XS4-I is a digital microstepping exposure system that is equipped with two auto-focus heads and a unique ozone-free atomic oxygen cleaning unit. It also features a 5-axis motor stage for fully automated registration, alignment, and overlay. The advanced photo-tooling glass and stage are also fully programmable, enabling flexible and accurate patterning for complex applications. XS4-I includes a highly accurate two-axis X-Y stage with a maximum exposure area of 13.8 inches x 13.8 inches. The unit is capable of exposure speed of up to 60 cycles per second and features an expandable light source with options from 365nm to 515nm UV wavelength. DNS / DAINIPPON XS4-I also features the Universal Arfadian Multi-Level Photoresist Technology which offers superior resolution and enhanced chemical stability. DNS XS4-I is an excellent choice for a variety of photolithography processes, primarily for applications using negative photoresists. The high speed and precision of this machine allows high manufacturing outputs in a wide range of applications. The ozone-free atomic oxygen cleaning makes it an ideal solution for ozone-sensitive applications such as OLEDs and photo-flexible devices. The intuitive user-friendly interface also allows for easy customization and operation of the tool, including exposure modes, processing parameters, and software updates. DAINIPPON XS4-I also features a comprehensive safety procedure that ensures operator safety throughout the lithography process. Overall, XS4-I is an exceptional photoresist asset, capable of achieving high resolution, clarity and precision, while remaining compliant with high-grade photolithography processes. It is the ideal solution for photolithography applications requiring high throughput and accuracy.