Used EATON / LSI 6000 & 6000XL #29581 for sale
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ID: 29581
Wafer Size: 2-6"
Track Systems. Can be fully supports with Full PCB repair, remanufactured new or rebuilt, Custom configuration available.
EATON / LSI 6000 & 6000XL photoresist systems are industrial systems specifically designed for the production of semi-conductors such as Image Sensors, Memory Chips, and Microprocessors. Photoresist systems involve using light to pattern the semiconductor's components. The 6000XL is an updated version of the original 6000 equipment, offering a larger process area, improved performance, and better scalability. LSI 6000 is designed with a large 10x14 inch process area, allowing for a variety of patterns to be produced in a single photoresist system. Initial exposure of the target is done by a Digital Mask Aligner (DMA), which projects the desired pattern of light onto the target substrate. The unit features full field scanning (FFS) technology, which allows for a more precise patterning of the substrate. This technology also eliminates the need for manual DMA alignment to ensure accuracy and consistency. In addition, EATON 6000 can be used for post exposure smoothing (PES), a process which smooths out the sidewalls of the semiconductor components for improved performance. Furthermore, the machine is equipped with an Auto-Exposure Verification (AEV) feature, which automatically checks the accuracy of the exposure readings against a reference standard. This helps to ensure accuracy and process consistency. Finally, EATON / LSI 6000XL offers improved performance and scalability compared to the standard 6000. This upgraded model is equipped with a larger 20x30 inch process area, improved FFS technology, and improved user-interfaces. Furthermore, the tool is upgradeable to the standard post-exposure smoothing process, allowing users to customize their setups accordingly. In conclusion, LSI 6000 & 6000XL photoresist systems are designed specifically for production and fabrication of semiconductor components. These systems offer improved performance and scalability compared to the original 6000 model and feature a variety of features including DMA, FFS, and PES. Finally, the upgraded model also features an AEV for improved accuracy and process consistency.
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