Used EBARA CADS HVM #9112898 for sale

Manufacturer
EBARA
Model
CADS HVM
ID: 9112898
Vintage: 2004
Plating systems, 2004 vintage.
EBARA CADS HVM is a photoresist equipment developed by EBARA, which enables fast and accurate photolithography processes. The system enables the creation of metal lines and other patterns on microelectronic devices with a high degree of accuracy. This unit uses an electronic scanning machine with advanced laser optics, a wide range of photo resist chemicals, and a high-performance mask aligner tool. CADS HVM asset includes a high-precision laser source that illuminates the sensitive resist film. The laser beam is then modulated according to the pattern that needs to be printed, and the beam is then directed onto the resist layer. An advanced optical model is then used to project the beam directly onto the resist layer for high-resolution patterning. EBARA CADS HVM also uses a high-precision mask aligner equipment for accurate registration and pattern transfer of the pattern onto the resist layer. The system is capable of printing patterns as small as 0.05um in size and up to 180um in pitch. The unit also provides integrated beam profile control so that complex patterns can be accurately reproduced. CADS HVM machine also features a range of photo resist chemicals which allow it to be used for a variety of applications. The tool's precise control of wavelengths, temperatures, and photo resist chemicals, provides good adhesion of the resist to the substrate and ensures highly precise patterning. To ensure accurate patterning, EBARA CADS HVM also features integrated software and hardware diagnostic systems. These can detect errors in the asset such as low-power laser source, deviations in the mask aligner, as well as any errors in the photo resist chemicals. In conclusion, CADS HVM model is an advanced photolithography equipment that offers fast, accurate, and precise patterning of microelectronic devices at a high degree of resolution. Its integrated mask aligner system, range of photo resists, and advanced laser source, provide excellent performance in a variety of applications. The integrated diagnostic systems also provide excellent accuracy and quality assurance.
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