Used EBARA UFP 200A #9100402 for sale

Name: EBARA UFP 200A
Brand: EBARA
SKU: 9100402
Availability: SoldOut

It looks like this item has already been sold. Check similar products below or contact us and our experienced team will find it for you.

Tap to zoom

Sold

Photoresist

Manufacturer

EBARA

Model

UFP 200A

ID: 9100402

Wafer Size: 8"

Vintage: 2003

Full automatic Cu plating system, 8" Main body Controller Wafer holders Wafers: W8-0333834-01 Semi standard 200mm, V notch 725um thick, semi-standard 200mm OF thickness 725um Plating: Post Cu Method Electronics Time: 90 min Currency density: 5.4A/dm2 Liquid temp: 25°C Plating sink: Dip Anord including P Thickness: 110~120 um Re-wiring Method: Electronics Time: 14 min Currency density: 2.0A/dm2 Liquid temp: 25°C Plating sink: Dip Anord including P Thickness: 6.5 um Transfer by robot Operating mode: automatic, maintenance, return Cu plating Dry in/Dry out Liquid insert Liquid inside sink and tubing can be drawn Semi standard cassette applicable Semi standard load port applicable (25) Fluoroware 200mm PA200-79MD Semi standard cassette applicable robot Can place wafers on rinse dryer Can place wafers on notch aligner Can handle wafers on notch aligner Notch aligner can detect wafer notch Rinse dryer can rinse wafers after plating Can dry after plating Holder transfer robot can remove wafer holder from wafer placing position Wafer holder standard position from each sink Stock sink: 2 x 19 Material: PVC Voluum: 194 L Accessories: Jig placing plate, liquid sensor, wafer holder sensor Post water rinse: 2 x 3 Material: PVC Volume: 72 L Accessories: Jig placing plate, liquid sensor Post process sink: 2 x 1 Material: HTPVC Sink: Upper over flow Volume: 37 L Accessories: jig placing plate, liquid sensor, circulation pump, temp sensor, temp unit Water rinse: 2 x 1 Material: PVC Sink: quick damp Volume: 17 L Accessories: jig placing unit, liquid sensor Cu plating: 2 x 26 Material: HTPVC Sink: upper over flow Volume: 280 L Accessories: Jig placing unit, liquid sensor, liquid mixer, plating liquid circulation pump, temp sensor, temp unit Blow: 2 x 1 Material: PVC Volume: 17 L Plating(spare) 2x2 Material HTPVC sink upper over flow Volume 72L Accessories Jig placing plate, liquid sensor, liquid mixer, plating liquid circulation pump, temp sensor, temp unit Waste sink 1 material PVC Volume 205 L Accessories liquid surface detector, waste liquid pump, temp sensor Tubing Can circulate plating liquid can keep temperature at 25°C ±1° Can exhaust waste liquid Can add pure water Currently warehoused 2003 vintage.

Read More Close

EBARA UFP 200A is a photoresist equipment designed for ultraviolet light exposure and high precision etching of microelectronic substrates. The system utilizes a high-power, stabilized lamp to provide a powerful and efficient source of the necessary UV radiation. Its adjustable filter wheel allows for fine-tuning of the spectral output to achieve optimal work performance. The machine is provided with a highly efficient air-cooled condenser to help maintain working temperatures during the exposure process. Additionally, the unit features an anti-static machine to reduce the risk of contamination. UFP 200A photoresist tool has an array of features designed to support high performance processing. It has a user-friendly touch-screen interface and a wide range of settings, allowing for accurate and precise control over the exposure process. The asset's digital output can be used to drive other equipment, such as scanners, to facilitate the etching process. Additionally, it can be used with a variety of substrates, including metals, ceramics, and silicon. The model is designed for a broad range of etching applications. Depending on the temperature and pressure settings, EBARA UFP 200A can etch to a depth of up to 8 microns per pass. Its laser-based photosensor enables precise and accurate control over exposure time, error detection, and automatic correction processes. The equipment is programmed to perform pre-heating, exposure, and post-harden processes, as well as etching processes. UFP 200A photoresist system is a reliable and efficient unit designed to accurately replicate and etch high-resolution structures on various substrates. Its user-friendly interface and wide range of settings offer maximum functionality while assuring precise results. The robust design of the machine ensures years of reliable performance, making EBARA UFP 200A an excellent choice for photoresist and microelectronic processing.