Used EBARA UFP 200A #9198040 for sale

EBARA UFP 200A is a state-of-the-art photoresist processing equipment designed to meet the high-end requirements of photomask production. It is capable of producing high resolution features and line-widths of less than 4.5μm. The system utilises a laser light source at the wavelength of 405 nm to produce an image on a photoresist layer on the desired substrate material. The photoresist is one of the most important parts of advanced photolithography processes, applied on a patterned substrate for semiconductor manufacturing. UFP 200A employs advanced beam scanning technologies, such as scan and line encoding and picture elements, which enable automation and high-precision reproduction of patterns. This unit is also equipped with Industry 4.0 capabilities that enable constancy of production conditions even as environmental conditions outside of the factory floor fluctuate. EBARA UFP 200A also offers superior image quality and high alignment accuracy as well as precise feature and line-width control. UFP 200A features an adjustable focus distance which enables the use of various substrates while maintaining the same degree of accuracy and resolution. Multi-layer exposure is possible with EBARA UFP 200A, which has a built-in motion axis which allows for smooth movement of the substrate between layers of the photoresist film without the need for external positioning. Additionally, the machine possesses high linearity due to its constant laser power output which maintains consistent resolution over the entire field of the exposure. For safety purposes, UFP 200A is also equipped with a toxic vapor purification tool. This asset filters out hazardous gases to ensure a clean environment while the user is operating the machine. EBARA UFP 200A also features a fast-acting airbrake model which ensures precision based operation with minimal noise and virtually no vibration, making the machine compliant with even the most stringent standards. In conclusion, UFP 200A is a robust and dependable machine designed for advanced photolithography processes. Its automation and advanced motion-scan capabilities along with its high alignment accuracy and picture quality make it ideal for photomask production. Furthermore, its toxic vapor purification equipment and airbrake system offers added flexibility and safety. EBARA UFP 200A is a great choice for those looking for reliable and high-end photoresist processing.