Used EBARA UFP 300A #9132639 for sale

Manufacturer
EBARA
Model
UFP 300A
ID: 9132639
Wafer Size: 12"
Vintage: 2002
HVM Auto plater machine, 12" Ni Cu PbSn Lead tin (3) Chemistry capabilities 2002 vintage.
EBARA UFP 300A is a high performance photoresist equipment designed for the processing of single exposure and dual contrast semiconductor wafers at a nominal resolution of 0.5-2.0 microns. The system includes a compact stationary aluminum resist coating unit which is capable of controlling the speed, volume and mixing ratio of the resist to aid in optimal wafer coating. The coating unit utilizes EBARA patented nozzle technology to provide precise and repeatable physical and chemical coating properties. The unit also includes an advanced, self-contained post process development module with a built-in photoresist ink dispenser and a post process, air-based clean station. The module can process wafers up to 300mm in size and provides precise, repeatable development, etching, and stripping processes with minimal disruption of wafer cleanliness. The clean station utilizes nitrogen spraying to ensure a high quality flux-less process. The machine exhibits excellent resolution with high quality surface image formation and also offers the possibility of controlling the relative and absolute differences in the photoresist film thickness at the wafer level. The tool supports both batch and continuous processes and has an open electrical module structure which is flexible enough to incorporate other processes. Additionally, EBARA UFP-300A includes a built-in interface for connection to a host computer asset, allowing for full on-line monitoring and control of the model. The equipment provides a user-friendly operation with an intuitive graphical user-interface (GUI) and a robust design with a low standby power consumption. UFP 300A also has a memory capacity of 200GB, accommodating even the most demanding software applications from multiple vendors. In summary, UFP-300A is a highly reliable and user-friendly photoresist system designed for the processing of semiconductor wafers. It is capable of producing high quality images with single exposure and dual-contrast and offers a customized user-friendly GUI for complete on-line monitoring and control of the unit. The machine is a cost-effective solution for the modern semiconductor processing industry.
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