Used EBARA UFP 300A #9228100 for sale

EBARA UFP 300A photoresist equipment is an ultra-precision high-performance modulator for advanced maskless lithography applications. This system enables very high resolution imaging—down to single micron feature size—across a large area of a substrate. It features extremely fast response times with a settling time of just 50 nanoseconds, allowing for precise positioning and regulation of the imaging beam. EBARA UFP-300A is controlled using a powerful FPGA-based unit that allows for highly efficient positioning of the scanning beam as well as data acquisition and processing. The machine uses a high-sensitivity photoresistor to detect the ultra-violet light generated by the scanning beam and then modulates the beam accordingly to achieve the desired resolution. This photoresist tool also allows for automatic alignment of the scanning beam to ensure uniform and high-resolution exposures across the entire substrate surface. UFP 300A is equipped with the latest dust suppression technology, allowing it to be operated in a cleanroom environment. The asset comes with an array of accessories, such as filters and emission collectors, to ensure maximum output and quality. The model is also equipped with a full suite of safety features, including interlocks to prevent accidental exposure of the substrate to the beam. UFP-300A is designed to meet the demand of the most complex maskless lithography requirements. Its high-precision alignment equipment, coupled with its ultra-fast response time, allows for extremely fine resolution over large areas. This makes it an ideal solution for manufacturing processes that require extreme photolithography precision.