Used EIKO IB-3 #293793575 for sale

EIKO IB-3 is a next-generation photoresist equipment designed for both bi-layer and tri-layer photomasks, and utilizes dedicated advanced technology to ensure highly precise alignment and high-sensitivity exposure performance. The system is capable of producing both single-, bi-layer, and triple-layer photomasks using a high resolution scan head with 1-micron accuracy and 0.55nm resolution. It is also equipped with a high-speed mask processor for rapid measurement of photomask parameters such as line widths, uniformity, and contact holes. Additionally, its thin-film etch module allows for high-precision removal of positive resist substances for exposure and etching. In terms of accuracy, IB-3 can reliably produce line widths as small as 0.2-0.3 microns, with an integrated real-time exposure stability of ±100nm/5s. Its ability to produce high-accuracy lines is further enhanced by its use of a beam panel that can control the shape of the light beam while decreasing exposure time. The unit's automated alignment machine allows for highly precise alignment measurement with 0.1-micron accuracy, while its high-sensitivity photoresist is capable of reliably producing complicated layouts with multiple layers. Finally, EIKO IB-3 is highly reliable, featuring a "zero" defect rate, and is designed with standalone capabilities to make it the ideal choice for demanding lithography processes. Its powerful but easy-to-use graphical user interface supports all stages of the lithography process, and its integrated traceability features ensure data accuracy. Furthermore, its advanced maintenance service design allows for easy maintenance and repair, ensuring its reliable performance in high-volume production environments.