Used ELS TECHNOLOGY ELS3604FA #293630295 for sale

ELS TECHNOLOGY ELS3604FA from ELS TECHNOLOGY is an advanced photoresist equipment designed for optoelectronic device manufacture. The system is comprised of a lithography workstation, a mask aligner, and a photoresist unit in one complete integrated unit. The lithography workstation includes a high-performance scanarm, a fixed imaging structure, and a proprietary co-axial micro-lens array which provides a precisely controlled light field enabling intricate device features to be printed with submicron feature size and resolution. The scanning unit ensures rapid exposure cycles and features an automated focus calibration machine. The tool's mask aligner offers outstanding image quality and enables high throughput of production with both conventional mask media and advanced imaging technologies, such as MOEM (Micro-Optical Electro-Mechanical) and MAEM (Micro-optical Alignment Electro-Mechanical). The mask aligner allows for highly precise alignment of masks and substrates and can be adjusted for resolution down to a few nanometers. The photoresist unit of the asset has an active HeNe laser for light irradiation, enabling high resolution photolithography down to 200nm and providing excellent reliability and repeatability at nanometer scales. The unit can process a variety of photoresists, such as dry film on wafers, chemical and thermal sensitizers for quick development, and high temperature etchants for compatibility with CTO (ceramic to metal) seals. ELS3604FA photoresist model integrates a high performance lithography workstation, a precise mask aligner, and a reliable photoresist unit in one complete unit - offering an extremely capable and cost effective solution for optoelectronic device manufacture. With its high resolution imaging, excellent reliability and repeatability, and versatile resist processing capability, ELS TECHNOLOGY ELS3604FA provides users with a comprehensive production solution.