Used ELS TECHNOLOGY ELS804FA #9133866 for sale

ELS TECHNOLOGY ELS804FA is a high-precision photoresist equipment designed specifically for flexible polymer substrates. This system uses a specialized architecture of reflective optics paired with high-power, auto-focus LED lighting to provide the user with precise alignment of coating and etching for their specific application. ELS804FA utilizes an imaging unit that includes an array of dynamic LEDs, which are independently controlled and adjusted for quick and efficient setup. This dynamic lighting allows for high precision alignment of de-coating and etching operations. Additionally, each LED is equipped with a temperature sensor to ensure that the lighting is within optimal ranges for efficient processing. By using an auto-focus machine, ELS TECHNOLOGY ELS804FA is able to precisely focus the coating and etching patterns while keeping the process consistent. The auto-focus feature is further optimized with a built-in image processing tool, which detects any potential alignment issues and corrects them accordingly. ELS804FA also includes temperature-controlled etching functionality, which ensures that the etch processes are operating within optimal temperature ranges. Additionally, this asset features a proprietary model of instantaneous evacuation of the entire equipment chamber, which prevents potential risks associated with excessive vapor accumulation during the etching process. ELS TECHNOLOGY ELS804FA also includes an efficient and effective coating delivery system. This delivery unit is designed to allow for maximum coverage of the substrate while keeping the process simple and cost-effective. This includes an integrated, pulsed coating machine which ensures that the coating consistently applied and properly distributed on the substrate. Overall, ELS804FA photoresist tool is an efficient and reliable solution for producing high-precision, flexible polymer substrates. Its proprietary architecture and built-in features make it the perfect choice for many industries looking to apply coatings and etchings with tight tolerances. It offers the user quick setup time, precision alignment, and improved coverage of the substrate for all their application requirements.