Used ETS / LINDGREN ETN-1100-110 #9078435 for sale

ETS / LINDGREN ETN-1100-110 photoresist equipment is a high-precision, state-of-the-art lithography system designed for multi-level mask making and microelectronics packaging applications. The unit is capable of exposing patterns on photoresist layers with a resolution of up to 10,000 nanometers per feature. It uses a conventional 405 nanometer laser diode as a light source, along with a number of precise optical components, allowing for reliable and consistent pattern generation. ETS ETN-1100-110 machine features two masks that can be used to transfer a photomask onto the substrate. The tool's high-accuracy design incorporates a computer controlled precision scans asset, allowing for a full range of exposure parameters including indexing, field scanning and pattern placement. The model allows the user to select any range of fields and feature sizes from 10 to 10,000 nanometers in diameter. The equipment also boasts a powerful optical element customization and alignment features that help ensure accuracy and precision during the mask making process. LINDGREN ETN-1100-110 can be programmed for complex pattern replication, enabling a wide range of applications including printed circuit boards, wiring diagrams and complex integrated circuits. In addition to these features, ETN-1100-110 includes automated transparent alignment (TA) capabilities, designed to ensure the accuracy and repeatability of alignment when creating exquisite patterns for multi-level masks. The TA system includes an alignment stage and motorized stage that accurately position the photomask prior to exposure. To ensure optimal operation from the unit, ETS / LINDGREN ETN-1100-110 includes sophisticated process control functions and diagnostics, as well as state-of-the-art environmental and safety protection features. The machine includes an interlock tool designed to prevent personnel from entering the tool during operation. Additionally, ETS ETN-1100-110 includes a number of additional safety features, including a no-open-doors policy, safety glasses, protective clothing and safety alarms. In summary, LINDGREN ETN-1100-110 is a robust and reliable photoresist asset designed for high-precision mask making and microelectronics packaging. It is the perfect tool for designing a wide range of patterns on photoresist layers with a resolution of up to 10,000 nanometers and features powerful optical element customization and alignment along with automated TA capabilities. The model also includes a number of safety features and sophisticated process control functions, allowing it to be used safely and effectively.