Used EVATEC Solaris S380 #9360695 for sale

EVATEC Solaris S380 is an advanced photoresist system using photolithography for nanopatterning. It is a high resolution imaging workstation for research and development, or production focused on the latest, most demanding technologies. It combines an exposure tool, high-precision stepper motor, a three-axis workstation, an inspection station and a range of software functions to create and replicate features on the wafer or substrate. Solaris S380 is capable of exposing a range of photoresists, from conventional positive and negative resists to advanced special applications. It has varying exposure times of less than 1 second for direct write applications and up to 60 seconds for full image exposures. As a result, it is suitable for a wide range of photonic applications, such as optoelectronic, photonic devices, photolithography circuit boards etc. The core of EVATEC Solaris S380 is its high performance digital light processor. It processes up to 8M pixels per second and has a very high precision digital image control for photosensitive materials. It is capable up to ten times higher resolution compared to normal Digital Light Processing (DLP) systems, so that more detailed patterning is possible in the same field of view. Additionally, it feature reliable alignment even at very lowest levels of exposure, so patterns can be made accurately and precisely each time. The high-precision stepper motor enables quick and precise registrations of wafers for particle and feature alignment. It also features a high-performance scanning mechanism to move the exposure head in smooth and silent motion, while maintaining high accuracy and repeatability. The system is controlled by an easy to use user interface to help operators get the perfect results consistently. It has a variety of perforations tools to determine the parameters of an ideal exposure. Advanced software functions are available to facilitate the analysis of resist parameters. Overall, Solaris S380 is a robust and reliable photoresist system that provides researchers and manufacturers with efficient and high precision imaging solutions. It is capable of producing the most complex and detailed 3D patterns, thereby making it an ideal tool for researches and production tasks in photonics, optoelectronics, and other fields.