Used EVG / EV GROUP 101 #293590418 for sale

EVG / EV GROUP 101 photoresist equipment is a state-of-the-art chemical processing system used for patterning and etching metal film onto substrates. The unit utilizes a combination of advanced optical, electron beam, and chemical techniques to produce patterns in a wide range of metal films and substrates with high resolution capability. EVG 101 photoresist machine is designed to achieve high precision when depositing metal films over substrates. A variety of metals can be deposited at different thicknesses, and the tool has the capability of adjusting the etching properties depending on the characteristics of each individual substrate. For example, for a single substrate, the optical characteristics of the photoresist asset can be adjusted for different thicknesses of metal deposition so as to create patterns of a specific size. EV GROUP 101 model utilizes advanced processes for high-resolution patterning. The photoresist equipment's electron beam lithography (EBL) technology applies a finely tuned electron beam that can draw patterns of varying shapes and sizes onto the substrate. The system then uses a photoresist material for structuring the metal film in order to create a desired pattern. Photoresist materials are first applied in a thin layer over the substrate, then subject to varying doses of exposure, depending on the requirements of the desired pattern. Once exposed, the developed photoresist material acts as a mask that the EBL unit can use to transfer the shape of the desired pattern onto the substrate. This process of exposure and developing ultimately creates a pattern with a predetermined shape on the desired substrate. 101 machine also provides an effective method for etching. After patterning the desired patterns on the substrate, the tool uses an etching process to physically remove unwanted portions of the film. The etching process is driven by the chemical forces between the photoresist material and the metal film, the difference in within-substrate electrical resistivity, or the presence of various ions in the substrate. These chemical forces interact to remove the portions of the film that were not covered by the photoresist material, in order to create the final pattern. EVG / EV GROUP 101 photoresist asset is an effective tool for producing highly precise and intricate patterns in a wide spectrum of metal films and substrates. The combination of advanced optical, electron beam, and chemical techniques makes the versatile model suitable for many applications in the semiconductor, microelectronics, and related industries.