Used EVG / EV GROUP 101 #293749961 for sale

EVG / EV GROUP 101 is a versatile and sophisticated photoresist equipment developed to meet the needs of modern-day photolithography. It is based on a principle of electron-beam, reactive-ion etching (also known as E-Beam) to accurately and precisely deposit very thin layers of photoresist onto various substrates. The system is designed to provide reliable and consistent etching capabilities for a range of applications and requirements. EVG 101 unit consists of a gun, a microscope and a generator for the electron beam. The electron beam is created by the gun, which is mounted to the top of the machine and contains an electron gun power supply and a vacuum chamber. Inside the vacuum chamber, the electrons are manipulated and focused onto the mask, which holds the photoresist pattern. The microscope enables precise alignment and scanning of the electron beam. Photoresist is applied to the substrate (usually a wafer) through the electron beam before it is exposed to developer and crosslinker chemicals. These two processes, known as photodeposition and photodegradation, respectively, form the finished photoresist, which is then applied to the wafer. During the E-Beam process, the gun is manipulated and moved in an arc-like motion. This arc-like motion is known as Vortex Motion, and it allows the beam to be both fast and accurate in its scanning of the substrate, allowing for precise and clean etching results. The beam is continuously controlled via computer software, and the entire process is carefully monitored. The photoresist deposition process allows for a high resolution, multilayer deposition of photoresist layer. It is also capable of combining various resist layers, enabling the fabrication of very thin (microscale) patterns. Additionally, the tool is capable of directly etching and cladding through-holes and various other structures, as well as providing a high-resolution pattern for functional metallization. EV GROUP 101 asset is a reliable and cost-effective platform for advanced photolithography processes. Its high-resolution capabilities, durable construction, and highly controllable electron beam make it a reliable and versatile photoresist model for a variety of advanced production needs.