Used EVG / EV GROUP 101 #293751585 for sale

EVG / EV GROUP 101 is a photoresist equipment manufactured by EVGroup, a leading supplier of advanced photolithography equipment. The system is designed to produce high-resolution, high-performance microelectronic devices made of III/V materials like gallium arsenide (GaAs) or silicon germanium (SiGe). EVG 101 unit comprises a deep ultraviolet (DUV) photomask aligner, a UV stepper, a resist strip tool and a thermal oven. Together, these components provide precision alignment and exposure of the substrate, superior lithography performance, fast process capabilities and patented low-temperature resist strip. The deep ultraviolet photomask aligner is designed to rapidly and accurately position a resist-coated wafer to a custom photomask pattern over a large range of angles and pitches. The UV stepper allows for accurate and repeatable wafer printing of finely detailed structures using DUV radiation. The resist strip tool is used for the development and removal of post-expose photoresist layers, while the thermal oven all providing suitable thermal annealing without damaging the underlying material - a critical step in the lithographic process of fabricating high-performance microelectronic devices. Using DUV, EV GROUP 101 machine is capable of producing high-resolution patterns, with feature sizes down to 0.2 microns (0.00008"), with a high overlay accuracy and stability. The tool also supports multiple exposure modes to achieve optimized productivity and yield, while performing multiple alignment and exposure steps in a single cycle. In addition to traditional photolithography, 101 asset is also compatible with advanced techniques such as chemical-assisted ion beam etching (CAIBE) and low energy ion beam etching (LEIBE); both of which are used to precisely shape and trace patterns into patterned crystals with superior accuracy and resolution. EVG / EV GROUP 101 model is an industry-leading solution for a wide range of microelectronic device fabrication applications, offering high-precision and high-performance lithography for producing complex, precision VLSI and MEMS devices. It is optimized to meet the most stringent fab environment requirements, and provides superior accuracy, flexibility and performance.