Used EVG / EV GROUP 101 #293761358 for sale

EVG / EV GROUP 101 is an advanced photoresist processing equipment designed to precisely develop patterns on lithographic reticles. Used mainly in the semiconductor industry, this tool combines high-end mechanical and optical components to ensure top-quality reticles for use in semiconductor production. EVG 101 uses advanced optical imaging technology to deposit photoresist, which is a light-sensitive material. Photoresist is used to create patterns on wafers or reticles, enabling the manufacture of semiconductor, LED, and OLED devices. The selectable features of the tool enable it to accurately reduce reticle patterns or images with resolutions up to 125nm or greater. The system has a pre-aligner that is used for precise pattern placement and measurement, allowing it to achieve a uniform and repeatable reticle pattern. Additionally, the advanced control unit reduces setup time and automates issues related to photoresist deposition, making the entire process faster and more reliable. The tool is constructed with a high-accuracy X-Y stage which ensures precise placement of the photoresist. The motorized Z-axis provides precise movement of the reticle, ensuring precision in critical patterning processes. The machine also includes a software suite, allowing the user to customize a variety of parameters such as wafer size, number of exposures, resolution, exposure length and intensity. It also has an auto focus feature with a rate of up to five nanometers, which improves accuracy on the retells processed with the tool. The tool operates with a wide range of materials, such as photoresists, positive and negative resists and high-resolution coatings. It is designed to work with various substrates that can be either flat or curved, and works with a variety of recognized and standard reticles. Overall, EV GROUP 101 is an ideal solution for generating intricate reticle patterns with superior accuracy and repeatability. Its advanced optical imaging technology ensures precise deposition of photoresist, while its advanced software enables the user to customize parameters and customize the reticle. With its robust design and flexible platform, the tool satisfies the needs of the semiconductor industry beyond its peers.