Used EVG / EV GROUP 101 #9015368 for sale

Manufacturer
EVG / EV GROUP
Model
101
ID: 9015368
Wafer Size: 8"
Vintage: 2003
Spray coater, 8" Air pressure: 6-10 bar / 87-145 psi Vacuum: <100 mbar / 76 Torr abs Nitrogen: 6-10 bar / 87-145 psi Exhaust: 1 x 180 m^3/h, 1 x 400 m^3/h Power: 2 kW Fumex FA1: 230 V, 1 Phase, 60 Hz, 2.9 A Fuse: 5 A 2003 vintage.
EVG / EV GROUP 101 is a photoresist equipment which is a specialized set of tools and processes used in the fabrication of electronic components. This photoresist system works by selectively exposing a photosensitive material to light or electron beam radiation in order to create a patterned layer of material. This layer can then be used to create a variety of electronic components, typically on a microscopic scale such as with integrated circuit chips. The photoresist unit usually consists of a range of different tools and components such as an imaging tool, developer, light source, and tight control of these processes. The imaging tool allows the user to create detailed patterns on the surface of the photosensitive material. The developer then diffuses the desired pattern into the material, and the light source is used to activate the sensitive material, allowing for pattern transfer. EVG 101 machine specifically offers a superior level of accuracy and resolution over similar systems. This accuracy and resolution is achieved by using an advanced, precision-optical array that offers both high resolution and good depth of focus. EV GROUP 101 tool also has a wide range of software features, allowing the user to quickly modify their own designs to meet the requirements of the application in question. This can save significant amounts of time in the fabrication process, while also ensuring that the resulting components are of the highest quality. 101 photoresist asset can be used to create a broad range of electronic components, including microchips, integrated circuits, semiconductors, and more. Furthermore, the model allows for a degree of flexibility and customization, allowing the user to tailor their design to meet the specific requirements of their application. With its superior accuracy, resolution, and software features, EVG / EV GROUP 101 photoresist equipment is one of the most advanced and reliable photoresist systems available.
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