Used EVG / EV GROUP 101 #9229818 for sale

EVG / EV GROUP 101 photoresist equipment is a high-precision lithography system used in the photomask and lithography production industry. It is designed to perform precise, uniform and repeatable photoresist operations on thin wafers, providing an ideal tool for microfabrication and semiconductor device manufacturing. EVG 101 is a sophisticated imaging unit powered by a multi-axis split-axis construction. The machine consists of a blanket section, substrate processing section, and optical imaging section. The blanket section includes a blanket cleaning and coating chamber, a multi-axis substrate stage, a beam splitter, and a pattern alignment tool. The substrate processing section includes a pre-coating chamber, pre-coat monomer reservoir, loading chamber, soft bake station, exposure station, post bake station and development station. The optical imaging section consists of dual laser light sources, optical diffusers, and reticles. EV GROUP 101 photoresist asset is capable of high-precision imaging operations such as projection lithography, optical projection stepper, and excimer laser lithography. The model features highly automated imaging processes including pre-coating, pattern alignment, exposure, post baking, development and multiple pass imaging modes. During imaging, advanced inspection algorithms can be used to analyze the uniformity and accuracy of the patterns on the substrate. This equipment can also focus on very small features with extremely fine resolution. Furthermore, the system is designed to process substrates with a die size up to 350 mm. 101 is a robust and reliable unit that is designed for strict production requirements. It is compatible with a variety of photoresist materials, allowing for optimal processing of the substrates for a range of applications. The machine can also be integrated with advanced techniques such as chemical-mechanical planarization, spray coating, and molecular self-assembly. EVG / EV GROUP 101 photoresist tool provides users with exceptional performance and flexibility. It enables the efficient and precise production of precision photomasks and thin wafers for a variety of applications, making it an ideal choice for high-precision lithography operations.