Used EVG / EV GROUP 101 #9283636 for sale
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ID: 9283636
Wafer Size: 4"
Vintage: 2004
Spin coater / Developer system, 4"
(2) Hot plates
CD
2004 vintage.
EVG / EV GROUP 101 is a photoresist equipment used for advanced lithography that enables the direct fabrication of intricate patterns on semiconductor materials. This system enables the development of better-performing and smaller electronic products by facilitating the precise shaping of semiconductor features. EVG 101 unit is an advanced photoresist technology that enables steep pitch ablation and avoids any sidewall residues when etching micro-patterns into semiconductor materials. It utilizes a combination of e-beam and optical exposure and lithography to achieve optimal resolution and structure. The e-beam that is used by EV GROUP 101 allows the fine control of dose and patterning with high resolution levels. In addition, it has the ability to shape two-dimensional (2D) patterns defined by software commands. The machine also utilizes optics to focus the lithography process and ensure that the patterns are properly formed. By using a combination of the e-beam and optical exposure for lithography, 101 produces patterns with superior dimensional accuracy and precision. Furthermore, the integrated sub-resolution assist feature (SRAF) of the tool can improve the resolution of the patterns and eliminate taper angles. Moreover, EVG / EV GROUP 101 offers an effective solution for high aspect ratio patterning, allowing for the formation of high aspect ratio features down to 1:1 aspect ratios. The asset also enables copper-plating for smaller feature structures. The advanced EVG 101 photoresist model can be used to fabricate a wide variety of products, ranging from sophisticated micro-electronics to biomedical devices. It is a highly efficient and cost-effective solution for producing complex patterns with high precision in the semiconductor industry. Overall, EV GROUP 101 photoresist equipment is a powerful tool for producing intricate features with superior accuracy and resolution. This advanced system enables high-precision patterning and etching of small features, enabling the manufacture of higher-performing and smaller electronic products.
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