Used EVG / EV GROUP 105 #9197310 for sale

EVG / EV GROUP 105 is a photoresist equipment designed for industrial use. It is a semi-automated system which uses advanced optical technology and material science to provide a reliable and highly advanced photoresist tool for advanced lithography applications. This unit is commonly used in the semiconductor industry for resist processing, substrate masking, and patterning. EVG 105 utilizes a state-of-the-art photo-mask to create precise and accurate lithography patterns. The pattern quality is drastically improved by utilizing a linear diode array and an optimized light projection angle. Additionally, the machine is capable of patterning multiple layers in a single process, which dramatically reduces processing time and cost. EV GROUP 105 utilizes a two-plate tool that enables flexibility and reliable processing for a variety of resists. The top plate is semi-transparent and allows for the accurate transfer of a pattern from the mask to the resist film. The substrate is then placed on the bottom plate, and pressure is applied to ensure even distribution and accurate pattern transfer. This asset also has an external 4x microscope camera that enables improved alignment accuracy during the exposure process. The model is highly configurable and has a wide range of software options to suit various requirements. The optical printed capability supports various film thickness ranging from a 15nm line width to at least a 0.25um feature size. The equipment is also compatible with a variety of resist materials from the major suppliers. An integrated, user-friendly GUI enables easy and intuitive operation. 105 is designed to increase production throughput and quality while reducing process costs. The system is capable of high repeatability, accuracy, and throughput, which makes it ideal for industries with high production volumes. The unit is also built with maintenance and serviceability in mind, and is designed to be easily serviced to prevent downtime. Overall, EVG / EV GROUP 105 is a reliable and advanced photoresist machine. It combines innovative optical and material science technology for easy and efficient lithography patterning with unsurpassed repeatability and throughput. The tool is designed to meet the highest production volume and quality requirements, and provide a reliable solution for lithography patterning.