Used EVG / EV GROUP 105 #9245282 for sale

EVG / EV GROUP 105 is a photoresist equipment for semiconductor mask making, wafer-level packaging, and other advanced lithography applications. This system is designed to provide high-accuracy and precision lithography processing, while protecting delicate dies from exposure to intense energy sources. Its advanced features include an autofocus unit for robust imaging performance, a patented no-touch chuck technology to reduce wafer movement for better accuracy and improved throughput, and an integrated three-dimensional mask alignment scanner for improved overlay and accuracy. EVG 105 machine can be configured for a variety of photoresist processes, including ultraviolet (UV) exposure, photolithography, etching, and deposition. It utilizes high-power UV lasers, such as KrF (248nm) and ArF (193nm) sources, as well as advanced optics for improved process accuracy. The tool includes high-resolution, low-defect optics to maximize photo-image resolution. To improve image clarity, the asset is equipped with sophisticated image-resolution verification tools, such as point-spread-function analysis. The model's advanced, highly-sensitive pattern recognition algorithm for die-level alignment also minimizes misalignments and enables improved results in challenging forms of pattern recognition. The equipment is further equipped with cutting-edge software and advanced automation capabilities, allowing for fast processing, improved throughput and high yield. EV GROUP 105 has an integrated, highly-configurable wafer-handling system that allows for quick, precise loading and unloading of wafers, as well as secure storage solutions. It also includes a general-purpose wafer transport trolley to reduce overhead costs and ensure safe transport of wafers to and from the unit. The machine is equipped with several safety features, including an active air-cooling tool, a halogen lamp, an active gas cooling asset, and an emergency stop model (Cassavant). All of these features are designed to ensure proper operation and maximum safety of the equipment as well as the samples and personnel in operation. In conclusion, 105 photoresist system is a powerful, high quality and accurate solution for semiconductor mask making, wafer-level packaging, and other advanced lithography applications. It offers a robust array of features, including advanced optics, autofocus, and integrated pattern recognition algorithms, for improved performance. Additionally, a range of safety features provide the peace of mind required for precision lithography operations.