Used EVG / EV GROUP 120 #293590417 for sale

EVG / EV GROUP 120
Manufacturer
EVG / EV GROUP
Model
120
ID: 293590417
Automated coater processing system.
EVG / EV GROUP 120 is a lithography equipment designed for nanolithography and wafer processing. It uses a photoresist process to form nanoscale patterns on the surface of a wafer. The system utilizes a low-maintenance, low-power, and highly-efficient resist-coated wafers. The integrated process control unit and imaging machine provide high-resolution imaging, nanoscale positioning, and automated processing. EVG 120 begins with a wafer that is coated with photoresist. Photoresist is a material that is sensitive to light, and when exposed to light of specific wavelengths and intensities, the photoresist is hardened. Through a step-and-repeat photoresist process, patterns are formed on the surface of the wafer as the photoresist is hardened. The process is controlled by the process control tool that controls the exposure of the laser source to create the desired pattern on the wafer. The integrated imaging asset uses a high-resolution optical microscope and advanced imaging techniques, such as scanning electron microscopes and atomic force microscopes, to inspect the wafer for defects and to ensure that the wafer has been accurately processed. EV GROUP 120 also features automated alignment and processing model, which allows for accurate and repeatable performance of the patterned photoresist process. The automated equipment also reduces the risk of human error during the photoresist processing, allowing for consistent processing with minimal variation in the end result. 120 also includes an innovative safety system that uses a combination of sensors and hardware devices to monitor the environment and alert the operator if any processing condition falls outside of the specified parameters. This helps to reduce any potential risks to both the machine and personnel. In conclusion, EVG / EV GROUP 120 is a photoresist lithography unit designed for nanolithography and wafer processing. It uses a photoresist process to form nanoscale patterns on the surface of a wafer. The integrated process control machine and imaging tool provide high-resolution imaging, nanoscale positioning, and automated processing. The asset also features an automated align and processing model, as well as innovative safety equipment which helps to minimize any potential risks associated with the process.
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