Used EVG / EV GROUP 120 #293651179 for sale

EVG / EV GROUP 120 is a photoresist equipment used in photolithography processes for a wide range of precision applications. Photolithography is a process for etching patterns into a substrate (such as a silicon wafer) with the use of a light sensitive material called photoresist. EVG 120 photoresist system combines the performance of advanced lithography equipment with the user-friendliness of an automated platform to efficiently handle complex photolithography processes. EV GROUP 120 photoresist unit includes a medium resolution imaging platform that supports batch sizes from one to 200 wafers with a maximum wafer dimension of 200mm. The machine utilizes advanced optics, including an integrated mask aligner, to expose patterns onto wafers up to 6-inch in diameter. High-accuracy wafer alignment is achieved with a submicron resolution stage and overlay accuracy below 0.2 μm. The tool is capable of positioning, patterning, and through-beam scanning with laser or UV laser-assisted stage motion. It is capable of exposing non-uniformly doped regions, advanced techniques like hot-spot-superimposition and the highest throughput possible. The photoresist asset has an automated photoresist processing module for precise metrology and substrate surface quality. It controls the resist-coated wafer before and after exposing to create a precise and uniform resist pattern. The module also provides precise control of photoresist temperature, depth of exposure, and resist concentration. The model also includes a single-step developers which offer high through-put, precise resist thickness control, precise lateral resolution, and low variation. The developers are designed to be compatible with all photoresists, featuring a Dynamic Clean Module that performs End Point Detection and removes unwanted resist. The integrated Edge Bead Removal Equipment ensures clean substrate edges and removes any remaining resist. 120 is designed with a low environmental impact in mind, delivering a compact and efficient system with an operating temperature range of 20 to 55°C, allowing for reduced consumption of power and resources. All of these features make EVG / EV GROUP 120 photoresist unit an ideal choice for photolithography processes requiring precise, efficient and low-cost fabrication.