Used EVG / EV GROUP 120 #293830309 for sale

EVG / EV GROUP 120 is a photoresist equipment from EVG, popularly used in wafer-level processing for nano-scale devices. It is ideal for advanced wafer-level packaging, 3D-integration, MEMS/MOEMS, microfluidics, photomask processing and other related applications. EVG 120 features a top-down 12-inch wafer exposure system with a field size of 180 mm x 300 mm. It can process chrome-on-quartz masks up to 200 millimeters in diameter. The unit controls the position of the projection optics, magnification, and imaging direction, providing optimal flexibility and accuracy. The projection optics have a high transmission rate of >85%, making it capable of resolving structures with low-contrast feature sizes down to 0.3 microns. The machine is also capable of producing high-throughput and cost-effective device fabrication, as it is resistant to thermal stress associated with exposure at high-power settings and has very low outgassing. As a result, the offered imaging resolution and throughput times are much greater than comparable systems, making it ideal for high-volume production. Furthermore, the tool has several built-in features that make it highly reliable and user-friendly. In addition to complex control systems, EV GROUP 120 features highly-sensitive sensors to ensure accurate alignment and wafer repetition rates. The asset also uses a model-level mask alignment layer, which ensures consistent imaging in both x and y-directions, eliminating uncorrectable exposure errors. The equipment is designed to maintain a minimum dichroic ratio of 8 for quartz masks, ensuring clear imaging of even sub-micron structures. Aside from that,the system also features a cleanroom-friendly operation with a CDA-free operation. This essentially eliminates the need for re-circulation of harmful chemicals. 120 is currently one of the most reliable and advanced photoresist systems from EV GROUP, offering maximum resolution, accuracy, throughput and cost-effectiveness for wafer-level applications.