Used EVG / EV GROUP 150 #293759601 for sale

EVG / EV GROUP 150 is a photoresist equipment featuring automatic mask alignment, exposure and post-development processing in a single piece of equipment. It is a professional tool for processing a variety of different photoresist materials in a range of applications. The system has a built-in optical alignment and exposure unit, consisting of a multimode source, laser alignment machine and an intensity controller. The tool also provides a wide range of different post-development functions, including spin etching, additive processing and strip processing. EVG 150 is designed to process a wide range of different photoresist materials, including spin-on-glass (SOG) and fluoropolymer photoresist. It is designed to enable processes such as additive etching, blind via formation, differential etching and master substrate fabrication. The asset is capable of etching a variety of thicknesses, with a maximum etch depth of up to 1000nm. EV GROUP 150 features an automated mask alignment model, providing improved accuracy and repeatability when exposing a photoresist layer. The mask is mounted on a precision mechanical alignment stage, with a range of up to 50 μm. The equipment also features a digital image acquisition system for pattern recognition, ensuring accurate pattern alignment. The unit also provides exposure capabilities for a range of photoresist materials. It features a range of sources, including a high-power 405nm laser, an industrial Ar-ion laser and an ultraviolet (UV) laser. It is equipped with an exposure duration ranging from 35μs to 35s, enabling a wide range of exposure times and power levels to suit different photoresist materials. 150 also provides automated post-processing capabilities. The machine is equipped with a spin processor, allowing for etching of various thicknesses in one step. It is also capable of additive processing, enabling the application of specific layers of materials such as evaporative coatings. Additionally, the tool can offer strip processing, in which photoresist is precisely removed from the exposed area. EVG / EV GROUP 150 is the perfect choice for a wide variety of photoresist processing applications. It enables accurate, repeatable and reliable results, and can be used to process any photoresist material. The asset also benefits from a host of post-processing functions, making it an ideal solution for advanced research and development.