Used EVG / EV GROUP 150 #9269960 for sale
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EVG / EV GROUP 150 is a high-precision photoresist processing equipment from EVG (EV GROUP). A photoresist processing system uses optical attachments such as laser microscopes or etching tools to etch or pattern substrate surfaces. EVG 150 provides a unique combination of advanced features and outstanding performance. The unit is composed of three core components, each with its own unique features and capabilities. It includes a high-precision wafer stage, a scanning optics unit, and a UV-LED light source. The wafer stage is capable of both manual and automatic operation. It is designed to show high levels of repeatability when acquiring and positioning substrates for photoresist processing. The scanning optics unit is designed with advanced optics components that ensure high image quality. It is capable of wielding multiple projection objectives with magnifications ranging from 10X to 250X. The optics unit is also equipped with a unique high-sensitivity depth control machine to ensure precise focus during processing. The UV-LED light source is designed to provide a stable light supply with a high level of power. It is capable of producing pulses up to 12 m duration in order to achieve high-precision etching or patterning. The light source includes precise control mechanisms such as shutter, speed, voltage, and current adjustment. The combination of these features enables EV GROUP 150 to provide superior performance during the photoresist processing. The tool can provide high-precision alignment of substrates, high-resolution imaging, and precise etching of patterns. In addition, the asset includes an intuitive user interface that allows users to easily control parameters and monitor processes in real time. Overall, 150 is an ideal model for photoresist processing applications. It offers high precision and reliability while providing an intuitive user experience. Its unique combination of features and capabilities make it an excellent choice for processing sensitive substrates or patterning complex shapes.
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