Used EVG / EV GROUP 250AV #9200716 for sale

EVG / EV GROUP 250AV is an advanced photoresist equipment designed for advanced photolithographic technicians. This system is capable of creating intricate structures with high accuracy, making it an ideal tool for photolithographic technologies. The unit utilizes a special vacuum chuck and PC controlled motorized stage that is able to precisely move on the X, Y and Z axes. This ensures a precise positioning of the wafers or substrates to be processed. This allows the machine to create complex and detailed patterns with minimal errors. The tool also features an automated wafer alignment asset that uses a laser perpendicular reference to detect a wafer's position and place it correctly concerning its target pattern. This is essential for precise alignment and eliminates the possibility of unwanted distortion of the pattern due to misalignment. The exposure processes are handled by a high intensity mercury lamp. The lamp provides a spectrum of near ultraviolet waves that can be used for both photoresist exposure and dry resist etching. Each parameter of the exposure process, such as intensity, duration and wavelength, is carefully controlled, with built-in memory functions for multiple exposure recipes can be saved for future use. EVG 250AV also features an electrical bias model to further control the exposure process. This bias equipment applies a constant voltage to the material being exposed, allowing for the precise tuning of a variety of physical properties. This can also be used for post-processing procedures such as insulation layers and chemical mechanical polishing. Finally, the system also comes equipped with an advanced thermal control unit that is capable of accurately controlling the temperature of the environment. This ensures accurate and uniform exposure across the entire substrate, ensuring consistent results and avoiding scorching or damage to delicate materials. EV GROUP 250AV photoresist machine is an advanced, high-performance piece of equipment designed to create micro-patterns with unsurpassed accuracy and quality. With its combination of advanced motorized stages, automated wafer alignment, and advanced thermal control, the tool is capable of creating incredibly intricate structures with outstanding precision and accuracy.