Used EVG / EV GROUP 250AV #9400866 for sale

EVG / EV GROUP 250AV is a photoresist equipment used for creating micro- and nano-scale structures for a variety of applications, including thin-film electronics, medical technology, and optical components. This system incorporates resist-coating, exposure, developing, and post-processing in one unit, allowing for uniform and repeatable patterning without the need for multiple tools and processes. EVG 250AV includes a unique resist coating deposition head that provides up to 1 KV of charge dose. This head evenly coats the substrate with a photoresist material, typically a combination of photohardening and chemically-amplified photoresist. By controlling the dose of the photoresist onto the substrate, the user can achieve extremely uniform and high-resolution patterns that are well-suited to device fabrication. The machine also incorporates an optical interface with advanced design algorithms and automated alignment capabilities. This advanced interface enables the user to well-defined pattern transfer onto the substrate with superior placement accuracy and uniformity. In addition, the optical interface supports a wide range of exposure wavelengths, allowing for the use of advanced materials in device fabrication. EV GROUP 250AV includes a high-precision developing tool that automatically dispenses a developer over the coated substrate. This asset ensures uniform and consistent developing, allowing for pattern transfer with superior resolution and uniformity. In addition, different types of substrates can be developed without changes to the recipe or hardware. Finally, 250AV includes a post-processing step that enables the user to remove any excess photoresist and improve the pattern transfer quality. This post-processing uses direct current (DC) ashing and plasma-assisted ashing, which selectively clears unwanted residues from the substrate surface. In addition, the user can incorporate post-etches and other treatments to finish the pattern transfer process. In conclusion, EVG / EV GROUP 250AV photoresist model provides the user with an automated and uniform solution for patterning micro- and nano-scale structures. This equipment enables efficient pattern transfer with high resolution, uniformity, and accuracy, allowing for the fabrication of complex devices.