Used EVG / EV GROUP 301 #293648317 for sale

EVG / EV GROUP 301 Photoresist Equipment is a resist processing system designed to ensure high quality, cost-effective fabrication of advanced semiconductor devices. The unit is designed to be compatible with a variety of photoresist formulations, providing users with flexibility and versatility for their specific application requirements. The core components of the machine are the resist and exposure units. The resist unit is outfitted with a proprietary single-seal coating platform and pneumatic dispense valve and a post-process quench station. This combination ensures a repeatable, reliable process and minimizes film thickness variations. The dispense volume, application speed, and pressure can be varied and adjusted for optimal processing. The exposure unit includes a high-performance, variable-wavelength, short-pulse laser exposure tool. This exposure asset is capable of controlling exposure spot size and exposure intensity with both high temporal resolution and high spatial resolution. It also has an exposure platen with a larger optical window area and an adjustable optical pin to allow for increased exposure uniformity over the entire field of view. EVG 301 Photoresist Model has a variety of integrated multiple processes and peripheral components, including laser image forming, dicing, and lithography processes. The equipment integrates edge timers for automatic edge detection and closed-loop control processes with variable illumination settings for precise, repeatable, and reliable exposure with easy-to-use software. EV GROUP 301 Photoresist System is designed and implemented with a series of safety features to ensure a safe and productive working environment. These features include a combination of hardware and software control, as well as a variety of interlocks, isolation circuits, and safeties built into the unit. The machine is also designed to minimize backplate effect, which can cause alignment and registration issues with high-resolution photomasks. 301 Photoresist Tool can also be integrated with a variety of specialized peripheral equipment and components, such as automatic particle detection, liquid immersion systems and spin-coating equipment. In summary, EVG / EV GROUP 301 Photoresist Asset is a reliable and highly customizable platform for achieving cost-effective and precision resist-etching solutions for applications ranging from prototyping to high-volume production. Its integrated safety features provide users with a safe working environment for their applications. Its multi-process and peripheral components provide users with flexibility, precision, and repeatability.