Used EVG / EV GROUP 301 #9071454 for sale

EVG / EV GROUP 301 is a high-quality photoresist equipment designed to precisely pattern thin film structures. Photoresist systems are used in a range of applications such as semiconductor device structures, microelectromechanical systems (MEMS), and micro-optoelectromechanical systems (MOEMS). EVG 301 is designed to be used in multiple processing steps such as coat, expose, and develop. The system features two alignment systems to ensure accurate and precise positioning of the photoresists. The first unit is a 5-axis automated aligner with an adjustable field size and stage speed. This machine offers a wide range of alignment features, including pattern matching, full die recognition, and process control. The second tool is a precision microscope alignment, which provides precise positioning adjustment and resolution up to 10 millimeters. The asset is equipped with a high-performance exposure model for high-volume imaging with both regular and off-axis illumination. It offers two interchangeable illumination modes, flash mode for spinning and batch exposure, and conversion mode for travel and speciality exposures. The equipment also provides both static and dynamic exposure process control, allowing users to easily adjust the exposure to match the exact requirements of each application. The system has a high-resolution mask pattern recognition unit, designed to automatically detect and correct mask misalignments and incorrect exposures. This ensures that each layer of photoresist is accurately exposed and patterned. The machine is also equipped with a high-precision spin developer, designed to ensure uniform spin-coating of photoresists. The tool can be expanded with additional accessories, including advanced vector generation software, a 3D auto-focus asset, and a microspot X-Y stage. Overall, EV GROUP 301 is a highly versatile and reliable photoresist model, suitable for a wide range of applications. The equipment offers precision alignment, high-performance exposure systems, and mask pattern recognition, ensuring high-quality and accurately exposed photoresists for each application. The system also provides users with additional accessories for added convenience and flexibility.