Used EVG / EV GROUP 301 #9284544 for sale

EVG / EV GROUP 301 Photoresist Equipment is an advanced, fully-automated lithography system that is designed to create lateral patterns on a variety of substrates. This unit is used in various industries, such as microelectronics, MEMS, and semiconductor manufacturing. The major components of this machine include a stepper/scanner, vacuum chuck, wafer processing, and developer station. The stepper/scanner controls the pattern transfer from the reticle to the wafer. This stepper/scanner features a large field of view for maximum pattern accuracy and throughput. The vacuum chuck ensures that the wafer is securely held against the tool for highly accurate lithography. The wafer processing module consists of an integrated exposure chamber, cassette loader, and pre-aligner, as well as a multiple-nose heat exchanger that is used to maintain a constant temperature. The developer station is used for development of the photoresist. It contains a developer tank, rinse tanks, and two chemical dispense systems for different photoresists. The developer module also contains a UV module for curing and inspecting the photoresist prior to development. The asset also features a flexible, modular design that allows users to customize the model to their precise application requirements. EVG 301 Photoresist Equipment also features state-of-the-art optics, which allow for high resolution imaging. This system can accurately reproduce patterns with features as small as 0.5 µm. The unit is also very fast and accurate, with a throughput of up to 1000 wafers/hr. The machine is simple to use and highly reliable. It is designed with an intuitive user interface to make it easy to use. Additionally, the tool is backed by exceptional after sales support and customer service. The asset also comes with an advanced software package, allowing users to develop their own process recipes and maximize their lithography results. In conclusion, EV GROUP 301 Photoresist Model is a highly reliable and user-friendly equipment that is designed to help users achieve highly accurate lithography results. This system features advanced optics, fast throughput, and robust development support that allows users to customize the unit to their unique application requirements.