Used EVG / EV GROUP 301 #9358755 for sale

EVG / EV GROUP 301 is a photoresist processing equipment used for a variety of applications. It is capable of aligning and printing masks for photomasks and wafers, as well as performing substrate deposition, dry and wet etch processes, develop processes, and many other pattern replication processes. The system is ideal for research and development projects. EVG 301 is equipped with an advanced patterning unit that facilitates accurate alignment and precise printing of photomasks, built with quick-loading mechanisms to reduce substrate and mask idle times. The machine's wafer-alignment process is automated via its individually controlled piezoelectric (PEV) elements, further reducing patterning time and enhancing the accuracy. The tool is designed with a modular platform, allowing for easy customization to suit the needs of a wide range of applications. The substrate-holding table is able to accommodate up to 30 substrates at once, and the asset can reach temperatures up to 200°C. The model also features an ergonomic lift equipment for easy substrate access and removal. The system also offers an advanced mask-making process. It is equipped with a 200 nanometer scan field optical unit, as well as exposure control for adjusting the force on the contact-point between the substrate and the mask. The machine is also capable of coating mask-polish and fine-finish capabilities, which helps reduce coating time and minimizes defectivity. In summary, EV GROUP 301 is a versatile and reliable photoresist processing tool with features to shorten substrate and mask processing times. It is ideal for the research and development of advanced patterning and imaging technologies.